Sieve Electrodes for Neural Implants

An in vitro model was developed to characterise the electrical properties of silicon microfabricated recording electrodes, using a Cu-wire mimicing a neural signal source. Phosphorous doped electrodes were used to achieve an all silicon device. The model was used to study signal amplitude as a function of distance between the electrode surface and the signal source. Signal crosstalk to neighbouring electrodes on the chips were recorded.The crosstalk was found to be 6 dB using an external reference electrode. Improvements were accomplished with an on chip reference electrode giving an amplitude crosstalk suppression of 20 dB. It was found that the amplitude decreased by a factor of 2 at a distance of 50 pm between the electrode surface and the signal source. Sieve electrodes were also implanted in the rat sciatic nerve and following a 10 week nerve regeneration period the dorsal and ventral (L5) roots in the spinal cord were stimulated. Compound action potentials were recorded via the chip. Lower leg muscle contraction activity was also induced by stimulating the regenerated sciatic nerve via the sieve electrode.